Title :
A new approach on advanced compact plasma sensors for industrial plasma applications
Author :
Schulz, Claudia ; Rolfes, Ilona
Author_Institution :
Inst. of Microwave Syst., Ruhr-Univ. Bochum, Bochum, Germany
Abstract :
A novel compact plasma sensor applicable for the supervision and control of industrial plasma processes is presented in this contribution. Based on the multipole resonance probe (MRP), the new planar multipole resonance probe (pMRP) flush-mounted into the reactor wall can be used for an effective suppression of disruptions on the plasma process itself. Using 3D-electromagnetic field simulations, the MRP and the pMRP are investigated and compared. Furthermore, limitations concerning position tolerances are shown and the suitability is demonstrated.
Keywords :
plasma devices; plasma diagnostics; plasma production; sensor fusion; sensors; 3D-electromagnetic field simulation; MRP; advanced compact plasma sensor; disruption suppression; flush-mounting; industrial plasma application; multipole resonance probe; pMRP; planar multipole resonance probe; reactor wall; Dielectrics; Materials requirements planning; Plasma measurements; Plasmas; Probes; Resonant frequency; Sensors;
Conference_Titel :
Sensors Applications Symposium (SAS), 2014 IEEE
Conference_Location :
Queenstown
Print_ISBN :
978-1-4799-2180-5
DOI :
10.1109/SAS.2014.6798958
