DocumentCode
1278074
Title
Comparison of DC and high-frequency performance of zinc-doped and carbon-doped InP/InGaAs HBTs grown by metalorganic chemical vapor deposition
Author
Cui, Delong ; Pavlidis, Dimitris ; Hsu, Shawn S.H. ; Eisenbach, Andreas
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
Volume
49
Issue
5
fYear
2002
fDate
5/1/2002 12:00:00 AM
Firstpage
725
Lastpage
732
Abstract
Zinc and carbon-doped InP/InGaAs heterojunction bipolar transistors (HBTs) with the same design were grown by metalorganic chemical vapor deposition (MOCVD). DC current gain values of 36 and 16 were measured for zinc and carbon-doped HBTs, respectively, and carrier lifetimes were measured by time-resolved photoluminescence to explain the difference. Transmission line model (TLM) analysis of carbon-doped base layers showed excellent sheet-resistance (828 Ω/□ for 600 A base), indicating successful growth of highly carbon-doped base (2×1019 cm-3). The reasons for larger contact resistance of carbon than zinc-doped base despite its low sheet resistance were analyzed. fT and fmax of 72 and 109 GHz were measured for zinc-doped HBTs, while 70-GHz fT and 102 GHz fmax were measured for carbon-doped devices. While the best performance was similar for the two HBTs, the associated biasing current densities were much different between zinc (4.0×10 4 A/cm2) and carbon-doped HBTs (2.0×105 A/cm2). The bias-dependant high-frequency performance of the HBTs was measured and analyzed to explain the discrepancy
Keywords
III-V semiconductors; MOCVD coatings; carbon; carrier lifetime; contact resistance; gallium arsenide; heterojunction bipolar transistors; indium compounds; photoluminescence; semiconductor doping; time resolved spectra; transmission line theory; zinc; 102 GHz; 109 GHz; 70 GHz; 72 GHz; DC current gain; InP-InGaAs:C; InP-InGaAs:Zn; InP/InGaAs heterojunction bipolar transistor; bias dependence; carbon doped base; carrier lifetime; contact resistance; current density; high-frequency characteristics; metalorganic chemical vapor deposition; sheet resistance; time-resolved photoluminescence; transmission line model; zinc doped base; Chemical vapor deposition; Contact resistance; Current measurement; Electrical resistance measurement; Gain measurement; Heterojunction bipolar transistors; Indium gallium arsenide; Indium phosphide; Transmission line measurements; Zinc;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.998577
Filename
998577
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