Deposition of YSZ Thin Films by Atmospheric Plasma-Assisted Pulsed Laser Ablation

Author

Ouyang, Zihao ; Cho, Tae-Seung ; Ruzic, David N.

Author_Institution

Dept. of Nucl., Plasma, & Radiol. Eng., Univ. of Illinois at Urbana-Champaign, Urbana, IL, USA

Volume

40

Issue

11

fYear

2012

Firstpage

2850

Lastpage

2852

Abstract

Yttria-stabilized zirconia (YSZ) thin films have been deposited on a nickel-based substrate by a laser-assisted plasma coating technique at atmospheric pressure. The substrate is heated by an atmospheric plasma torch to 800 °C to form a thermally grown oxide layer and is increased to 1000 °C during film deposition. The deposited films show columnar structures similar to films deposited in high-vacuum deposition methods. The microstructures of the deposited YSZ films have been examined by focused-ion beam and X-ray photoelectron spectroscopy.

Keywords

X-ray photoelectron spectra; focused ion beam technology; plasma deposited coatings; plasma torches; pulsed laser deposition; thin films; yttrium compounds; zirconium compounds; X-ray photoelectron spectroscopy; Y₂O₃-ZrO₂; YSZ thin film deposition; atmospheric plasma torch; atmospheric plasma-assisted pulsed laser ablation; atmospheric pressure; columnar structures; focused-ion beam spectroscopy; high-vacuum deposition methods; laser-assisted plasma coating technique; nickel-based substrate; pressure 1 atm; thermally grown oxide layer; yttria-stabilized zirconia thin films; Coatings; Educational institutions; Heating; Laser ablation; Plasmas; Pulsed laser deposition; Substrates; Atmospheric plasma; laser-assisted plasma coating at atmospheric pressure (LAPCAP); thermal barrier coating; yttria-stabilized zirconia (YSZ) film;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2012.2213099

Filename

6294457