Waveguide microcavity based on photonic microstructures

Author

Krauss, T.F. ; Vogele, B. ; Stanley, C.R. ; De La Rue, R.M.

Author_Institution

Dept. of Electron. & Electr. Eng., Glasgow Univ., UK

Volume

9

Issue

2

fYear

1997

Firstpage

176

Lastpage

178

Abstract

A waveguide based microcavity exhibiting a quality factor Q/spl ap/2500 has been realized by incorporating a /spl lambda//4 phase shift into a 1-D photonic microstructure. The microstructure has an overall length of 3 μm, consists of a deeply etched grating with very narrow (75 nm) air-gaps and exhibits a third-order stop band in the 800-900 nm wavelength regime. A comparison between measurement and simulation suggests that there is a thin (approximately 18 nm) skin of oxidized material at the etched semiconductor-air interfaces.

Keywords

Q-factor; diffraction gratings; etching; optical design techniques; optical fabrication; optical planar waveguides; optical resonators; oxidation; photonic band gap; semiconductor device models; /spl lambda//4 phase shift; 1-D photonic microstructure; 18 nm; 3 mum; 800 to 900 nm; deeply etched grating; etched semiconductor-air interfaces; measurement; narrow air-gaps; nm wavelength regime; optoelectronics miniturisation; overall length; oxidized material; photonic bandgap structure; photonic microstructures; quality factor; simulation; third-order stop band; waveguide based microcavity; Etching; Gratings; Microcavities; Microstructure; Optical materials; Optical waveguides; Semiconductor materials; Semiconductor waveguides; Surface waves; Vertical cavity surface emitting lasers;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/68.553082

Filename

553082