DocumentCode :
1279103
Title :
MOVPE-grown millimeter-wave InGaAs mixer diode technology and characteristics
Author :
Marsh, Phil ; Pavlidis, Dimitris ; Hong, Kyushik
Author_Institution :
Michigan Univ., Ann Arbor, MI, USA
Volume :
44
Issue :
7
fYear :
1997
fDate :
7/1/1997 12:00:00 AM
Firstpage :
1066
Lastpage :
1075
Abstract :
The merits of InGaAs-based millimeter-wave mixer diodes are explored experimentally and theoretically. Schottky junctions on InGaAs exhibit barriers (φb) in the neighborhood of 0.25 eV. The high mobility of InGaAs contributes to the low n+ sheet resistances of 1.9-5 Ω/square for 1-μm n+ InGaAs layers (ns=1.5×1019 cm-3, μ n=1800 cm2/V·s) grown with our in-house Metalorganic Vapor Phase Epitaxy (MOVPE) system, The design, material growth, fabrication, and characterization of InGaAs integrated mixer/antennae are reported. Pt plating technology, adapted here for InGaAs Schottky contacts, has improved the ideality factor (η) and yield relative to conventional evaporated Pt. With 810 μW of local oscillator power, applied to the diode, and zero DC bias, an integrated InGaAs mixer/antenna demonstrated an excellent diode performance of 199 K RF input double-sideband noise temperature with a corresponding single-sideband (SSB) conversion loss (Lc) of 5.0 dB at LO, RF, and IF frequencies of 94 GHz, 94 GHz±1.4 GHz, and 1.4 GHz, respectively. Likewise, the diodes in an InGaAs subharmonic integrated mixer/antenna demonstrated an equivalent RF-port double-sideband (DSB) noise temperature (Tmix) of 1058 K and single-sideband conversion loss of 10.2 dB at 180 GHz with a 90-GHz LO power (PLO) of 1.6 mW. Compared to GaAs diodes with RF coupling and IF losses removed, the single-ended InGaAs noise temperature results were within 46-100 K of those for state-of-the-art GaAs mixer diodes while requiring significantly less LO power
Keywords :
III-V semiconductors; Schottky diode mixers; circuit noise; gallium arsenide; indium compounds; losses; millimetre wave circuits; millimetre wave mixers; semiconductor epitaxial layers; semiconductor growth; vapour phase epitaxial growth; 0.25 eV; 1.6 mW; 10.2 dB; 180 GHz; 5.0 dB; 810 muW; 94 GHz; IF losses; III-V semiconductors; InGaAs; MOVPE; RF coupling; SSB conversion loss; Schottky junctions; double-sideband noise temperature; equivalent RF-port double-sideband noise; ideality factor; millimeter-wave mixer diode; sheet resistances; yield; Epitaxial growth; Epitaxial layers; Gallium arsenide; Indium gallium arsenide; Inorganic materials; Millimeter wave technology; Mixers; Radio frequency; Schottky diodes; Temperature;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.595933
Filename :
595933
Link To Document :
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