Title :
Low frequency and 1/f noise in wide-gap semiconductors: silicon carbide and gallium nitride
Author :
Levinshtein, M.E. ; Rumyantsev, S.L. ; Shur, M.S. ; Gaska, R. ; Khan, M.A.
Author_Institution :
A.F. Ioffe Physicotech. Inst., Acad. of Sci., St. Petersburg, Russia
fDate :
2/1/2002 12:00:00 AM
Abstract :
The results of experimental and theoretical studies of low-frequency noise in wide-bandgap semiconductors and wide-band-gap semiconductor devices are reviewed. The unusual features of the low-frequency noise in these systems include an extremely low level of noise in SiC and SiC-based devices and a large difference in the noise level in GaN-based films and GaN-based field effect transistors (FETs) (with the noise being much smaller in GaN-based FETs). The authors also report on the generation recombination noise in SiC and GaN-based materials and devices
Keywords :
1/f noise; III-V semiconductors; gallium compounds; junction gate field effect transistors; reviews; semiconductor device noise; semiconductor thin films; silicon compounds; wide band gap semiconductors; 1/f noise; GaAlN; GaN; SiC; dimensionless Hooge parameter; extremely low noise level; field effect transistors; gate leakage current; generation recombination noise; low-frequency noise; spectral noise density; transient behaviour; wide-band-gap films; wide-band-gap semiconductor devices; wide-gap semiconductors;
Journal_Title :
Circuits, Devices and Systems, IEE Proceedings -
DOI :
10.1049/ip-cds:20020328