Title :
Guest editorial special section on microelectronic test structures
Author :
Hazama, Hirofumi
Author_Institution :
Toshiba Corporation Semiconductor Company
fDate :
5/1/2002 12:00:00 AM
Keywords :
CMOS technology; Circuit testing; Manufacturing processes; Material properties; Materials testing; Microelectronics; Nonvolatile memory; Parameter extraction; Process design; Very large scale integration;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
DOI :
10.1109/TSM.2002.999591