Title :
Test structures for evaluating strong phase shift lithography
Author :
Ashton, Robert A. ; Kane, Brittin C. ; Blatchford, James W. ; Shuttleworth, David M.
Author_Institution :
Agere Syst., Orlando, FL, USA
fDate :
5/1/2002 12:00:00 AM
Abstract :
Test structures are presented for the evaluation of phase shift lithography on the gate level of a CMOS technology. The structures address the measurement of phase shift printed linewidth, the evaluation of transistors as a function of phase shifter geometry, and the detection of misalignment of contact windows to the phase shift printed gate
Keywords :
CMOS integrated circuits; integrated circuit testing; phase shifting masks; position measurement; size measurement; ultraviolet lithography; DUV lithography; contact window misalignment; gate level CMOS technology; phase shift lithography; phase shift printed gate; phase shift printed linewidth; phase shifter geometry; test structures; transistors; CMOS technology; Costs; Geometrical optics; Lithography; Phase detection; Phase measurement; Phase shifters; Printing; Resists; Testing;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
