DocumentCode
1283294
Title
Trends in lithography
Author
Halle, Linda F.
Author_Institution
Aerosp. Corp., Los Angeles, CA, USA
Volume
4
Issue
5
fYear
1988
Firstpage
11
Lastpage
17
Abstract
Current capabilities and advances in optical electron-beam, X-ray, and ion-beam lithography are discussed. Attention is restricted to the creation of the resist pattern. Equipment, resists, and processing are examined.<>
Keywords
lithography; resists; X-ray; ion-beam; lithography; optical electron-beam; processing; resist pattern; Electron beams; Electron optics; Focusing; Integrated circuit technology; Integrated optics; Lithography; Particle beam optics; Photonic integrated circuits; Production; Resists;
fLanguage
English
Journal_Title
Circuits and Devices Magazine, IEEE
Publisher
ieee
ISSN
8755-3996
Type
jour
DOI
10.1109/101.8119
Filename
8119
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