DocumentCode :
1283618
Title :
InP/InGaAsP/InGaAs SAGM avalanche photodiode with delta-doped multiplication region
Author :
Kuchibhotla, R. ; Campbell, Joe C. ; Tsai, Chia-Yin ; Tsang, W.T. ; Choa, F.S.
Author_Institution :
Microelectron. Res. Center, Texas Univ., Austin, TX, USA
Volume :
27
Issue :
15
fYear :
1991
fDate :
7/18/1991 12:00:00 AM
Firstpage :
1361
Lastpage :
1363
Abstract :
Gain-bandwidth products as high as 86 GHz have been reported for SAGM (separate absorption, grading, and multiplication) avalanche photodiodes. However, higher performance has been severely limited by very tight design constraints emanating from fundamental material properties. Smaller multiplication widths, needed to increase the gain-bandwidth product, have been difficult to implement due to the maximum doping limit in InP brought on by the onset of tunnelling. Fabrication of a novel SAGM APD is reported, in which the placement of change in the avalanche region is controlled through delta doping. The advantage of this approach results from the ensuing decoupling of the doping and thickness requirements of the avalanche region. Low dark currents and gain-bandwidth products of over 75 GHz have been obtained. In addition, by incorporating a surface reflector, a high quantum efficiency of 67% has been obtained with an absorption region only 1.1 mu m thick.
Keywords :
III-V semiconductors; avalanche photodiodes; gallium arsenide; gallium compounds; indium compounds; semiconductor doping; 67 percent; APD; InP-InGaAsP-InGaAs; SAGM; avalanche photodiode; delta-doped multiplication region; gain-bandwidth products; high quantum efficiency; optical receivers; photodetectors; separate absorption/grading/multiplication; surface reflector;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19910857
Filename :
81242
Link To Document :
بازگشت