DocumentCode :
1283627
Title :
The Role of Oxygen in a Large Area of RF-Powered Atmospheric Pressure Dielectric Barrier Glow Discharge Plasma in Sterilization
Author :
Pang, Hua ; Chen, Qiang ; Li, Bin ; Fei, Fei ; Yang, Size
Author_Institution :
Beijing Nat. Lab. for Condensed Matter Phys., Chinese Acad. of Sci., Beijing, China
Volume :
39
Issue :
8
fYear :
2011
Firstpage :
1689
Lastpage :
1694
Abstract :
A nonequilibrium Ar/O2 plasma at atmospheric pressure was generated between two parallel square electrodes by a 13.56-MHz power supplier. Experimental results demonstrate that the Ar/O2 plasma more effectively kills Staphylococcus aureus and Escherichia coli than the Ar plasma. When the O2 flow rate increases from 0 to 100 sccm step by step, the discharge voltage and the radio-frequency (RF) current always show sinusoidal waveforms, and the discharges maintain the α mode as well. In addition, the sterilization efficiency values of the RF-powered atmospheric pressure Ar/O2 plasma depend on the oxygen fraction in Ar gas. It is found that the sterilization efficiency of the Ar/O2 plasma is highest with 0.5 vol.% oxygen in argon gas, corresponding to the maximum production of O(3P) radicals. It is considered that the O(3P) radicals produced by the Ar/O2 plasma play a significant role in atmospheric plasma sterilization.
Keywords :
argon; free radicals; glow discharges; oxygen; plasma applications; plasma production; sterilisation (microbiological); α mode; Ar gas; Ar-O2; Escherichia coli; RF-powered Ar-oxygen plasma; RF-powered dielectric barrier glow discharge plasma; Staphylococcus aureus; discharge voltage; frequency 13.56 MHz; maximum oxygen radical production; nonequilibrium Ar-oxygen plasma; oxygen flow rate; oxygen fraction; parallel square electrodes; plasma sterilization; power supplier; pressure 1 atm; radiofrequency current; sinusoidal waveforms; sterilization efficiency; Argon; Discharges; Helium; Microorganisms; Physics; Plasmas; Radio frequency; Oxygen radicals; radio-frequency (RF)-powered atmospheric pressure plasma; sterilization mechanisms;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2011.2155104
Filename :
5962365
Link To Document :
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