Title :
Low threshold current lateral injection lasers on semi-insulating substrates fabricated using Si impurity-induced disordering
Author :
Hummel, S. ; Chen, Qian ; Osinski, J.S. ; Dapkus, P.D.
fDate :
7/18/1991 12:00:00 AM
Abstract :
The results of a laser design that uses dual Si impurity-induced disordering stripes to both bury the active region and provide lateral electron injection are reported. Without heatsinking, lasers have room temperature CW threshold current as low as 2.77 mA and a single facet external quantum efficiency as high as 30%.
Keywords :
integrated optoelectronics; semiconductor junction lasers; 2.77 mA; 30 percent; CW threshold current; GaAs-AlGaAs; Si impurity-induced disordering; buried active region; dual Si stripes; laser design; lateral electron injection; lateral injection lasers; low threshold current; room temperature; semi-insulating substrates; semiconductor lasers; single facet external quantum efficiency;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19910863