DocumentCode :
1283649
Title :
Low threshold current lateral injection lasers on semi-insulating substrates fabricated using Si impurity-induced disordering
Author :
Hummel, S. ; Chen, Qian ; Osinski, J.S. ; Dapkus, P.D.
Volume :
27
Issue :
15
fYear :
1991
fDate :
7/18/1991 12:00:00 AM
Firstpage :
1372
Lastpage :
1374
Abstract :
The results of a laser design that uses dual Si impurity-induced disordering stripes to both bury the active region and provide lateral electron injection are reported. Without heatsinking, lasers have room temperature CW threshold current as low as 2.77 mA and a single facet external quantum efficiency as high as 30%.
Keywords :
integrated optoelectronics; semiconductor junction lasers; 2.77 mA; 30 percent; CW threshold current; GaAs-AlGaAs; Si impurity-induced disordering; buried active region; dual Si stripes; laser design; lateral electron injection; lateral injection lasers; low threshold current; room temperature; semi-insulating substrates; semiconductor lasers; single facet external quantum efficiency;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19910863
Filename :
81248
Link To Document :
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