Title :
A fundamental limitation for bipolar transistor scaling
Author_Institution :
Dept. of Electr. Eng., Delft Univ. of Technol., Netherlands
Abstract :
A microscopic model of minority-carrier diffusion in a heavily doped emitter is proposed. Monte Carlo simulation demonstrates that statistical fluctuation in the base current is one of the fundamental limitations in high-speed applications of scaled bipolar transistors. For the transistor presently investigated, with 5.0- mu m/sup 2/ emitter area, 0.1- mu m junction depth, 8.5-ps measurement time, and 0.75-V emitter/base bias, the base current deviation is 43%. This sets up the maximum operating frequency for the transistor. More lightly doped emitters (such as for heterojunction bipolar transistors) will relax this limitation, but at a cost of increased contact resistance, especially when poly-emitters are utilized. Increasing the emitter/base bias will also make the base current rate more deterministic, but the other limitations such as power dissipation and contact resistance will become more obvious.<>
Keywords :
Monte Carlo methods; bipolar transistors; heavily doped semiconductors; minority carriers; semiconductor device models; Monte Carlo simulation; base current; base current deviation; bipolar transistor scaling; contact resistance; emitter/base bias; heavily doped emitter; heterojunction bipolar transistors; high-speed applications; junction depth; lightly doped emitters; microscopic model; minority-carrier diffusion; poly-emitters; power dissipation; statistical fluctuation; Area measurement; Bipolar transistors; Contact resistance; Current measurement; Electrical resistance measurement; Fluctuations; Frequency; Heterojunction bipolar transistors; Microscopy; Time measurement;
Journal_Title :
Electron Device Letters, IEEE