DocumentCode :
1283840
Title :
0.23 mu m gate length MODFETs on InAlAs/InGaAs/InP heterostructure grown by MOVPE
Author :
Tong, M. ; Ketterson, A. ; Nummila, K. ; Adesida, I. ; Aina, L. ; Mattingly, M.
Author_Institution :
Coordinated Sci. Lab., Illinois Univ., Urbana-Champaign, IL, USA
Volume :
27
Issue :
16
fYear :
1991
Firstpage :
1426
Lastpage :
1427
Abstract :
Modulation-doped field effect transistors (MODFETs) with 0.23 mu m gate lengths have been fabricated on an InAlAs/InGaAs/InP heterostructure grown by metal organic vapour phase epitaxy (MOVPE/MOCVD). Extrinsic DC transconductance as high as 800 mS/mm, and unity current gain cutoff frequency ft of over 120 GHz at room temperature have been achieved. These gm and ft values compare favourably with the best devices of similar gate length grown by molecular-beam epitaxy (MBE) and are the highest values reported for any device grown by MOVPE.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor epitaxial layers; semiconductor growth; semiconductor junctions; solid-state microwave devices; vapour phase epitaxial growth; 0.23 micron; 120 GHz; DC transconductance; HEMT; InAlAs-InGaAs-InP; MODFETs; MOVPE; heterostructure; metal organic vapour phase epitaxy; room temperature; semiconductors; submicron; unity current gain cutoff frequency;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19910894
Filename :
81282
Link To Document :
بازگشت