DocumentCode
1283936
Title
Hot-electron-induced minority-carrier generation in bipolar junction transistors
Author
Ishiuchi, Hidemi ; Tamba, Nobuo ; Shott, John D. ; Knorr, Christopher J. ; Wong, S. Simon
Author_Institution
Integrated Circuits Lab., Stanford Univ., CA, USA
Volume
11
Issue
11
fYear
1990
Firstpage
490
Lastpage
492
Abstract
The authors report on the observation and analysis of minority-carrier generation in the collector and the substrate of n-p-n bipolar junction transistors as a result of photons which are generated in the collector-base depletion region. Both the substrate current and the additional leakage current peak at V/sub BE/ approximately 0.8 V. In the authors´ model of the phenomena, the photons induce the generation of carriers both in the depletion region and in the neutral region. The generated minority carriers in the neutral region diffuse and contribute to the substrate current and the junction leakage current. The contribution of the carriers that are generated in the depletion region is not dominant.<>
Keywords
bipolar transistors; hot carriers; leakage currents; minority carriers; 0.8 V; carrier diffusion; collector; collector-base depletion region; depletion region; hot electron effects; junction leakage current; minority-carrier generation; n-p-n bipolar junction transistors; neutral region; photon induced carrier generation; photons; substrate; substrate current; Doping; Impact ionization; Laboratories; Leakage current; MOSFETs; Semiconductor process modeling; Substrates; Transistors; Voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.63010
Filename
63010
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