DocumentCode
1285220
Title
Low-loss PECVD silica channel waveguides for optical communications
Author
Grand, G. ; Jadot, J.P. ; Denis, H. ; Valette, S. ; Fournier, A. ; Grouillet, A.M.
Author_Institution
LETI, CEA-CENG, Grenoble, France
Volume
26
Issue
25
fYear
1990
Firstpage
2135
Lastpage
2137
Abstract
The authors report reproducible measurements of propagation losses in channel waveguides fabricated on silicon substrate by PECVD. The average value obtained from more than 50 different channel guides is 0.1 dB/cm at 1.55 mu m. The behaviour with wavelength is also presented and discussed.
Keywords
integrated optics; optical communication equipment; optical losses; optical waveguides; plasma CVD; silicon compounds; 1.55 micron; IOS2 technology; PECVD; Si; Si-SiO 2; channel waveguides; integrated optics; optical communications; propagation losses; reproducible measurements;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19901375
Filename
59642
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