Title :
A long pulse discharge excited ArF laser
Author :
Feenstra, L. ; Bastiaens, H.M.J. ; Peters, P.J.M. ; Witteman, W.J.
Author_Institution :
Twente Univ., Enschede, Netherlands
Abstract :
An X-ray preionised, discharge excited ArF excimer laser, λ=193 nm, has been studied in the long pulse regime. The laser performance is found to be primarily dependent on the discharge stability, and therefore, on the gas composition, preionization timing and the pumping power. Using X-ray preionization and prepulse-mainpulse excitation, laser pulselengths of up to 120-ns full-width at half-maximum at 4 mJ/l are obtained by decreasing the partial pressures of the active ingredients, F2 and Ar, and using Ne as a buffer gas. This is almost six times as long as usual for discharge excited ArF lasers
Keywords :
argon compounds; excimer lasers; laser transitions; optical pulse generation; preionisation; 120 ns; 193 nm; 4 mJ; ArF; F2-Ar-Ne; X-ray preionised ArF excimer laser; active ingredients; buffer gas; discharge stability; gas composition; laser performance; laser pulselengths; long pulse discharge excited ArF laser; long pulse regime; partial pressures; preionization timing; prepulse-mainpulse excitation; pumping power; Anodes; Fiber lasers; Gas lasers; Laser excitation; Laser stability; Optical buffering; Optical pulse generation; Optical pulses; Pump lasers; X-ray lasers;
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
DOI :
10.1109/2944.814992