Structure-based multi-planar images stitching

When there are more than one plane or one surface in a scene, structure error will happen during image stitching, such as structure missing structural distortion, structure disorder and structure repeated. This paper presents structure-based multiple planar best seam line method to solve these problems. With this method, the optimal seam line should have the minimal differences between the stitched images not only in intensity and gradient but also in structure. At the same time, once the optimal structure seam line is selected, the corresponding projection matrix used for image registration and stitching can be decided automatically. The experimental shows that it can solve reduce the structure error in multi-planar image stitching.