DocumentCode
12872
Title
Gate Oxide Degradation of SiC MOSFET in Switching Conditions
Author
Ouaida, Remy ; Berthou, Maxime ; Leon, Javier ; Perpina, Xavier ; Oge, Sebastien ; Brosselard, P. ; Joubert, Charles
Author_Institution
Lab. Ampere, Univ. de Lyon, Villeurbanne, France
Volume
35
Issue
12
fYear
2014
fDate
Dec. 2014
Firstpage
1284
Lastpage
1286
Abstract
Under realistic switching conditions, SiC MOSFETs reliability issues remain as a challenge that requires further investigation. In this letter, a specific aging test has been developed to monitor and characterize the electrical parameters of the SiC MOSFET. This allows estimations of the health state and predictions of the remaining lifetime prior to its failure. The gate leakage current seems to be a relevant runaway parameter just before failure. This leakage indicates deterioration of the gate structure. This hypothesis has been validated through analysis of scanning electron microscopy pictures, with a focused ion beam cut showing cracks within the polysilicon.
Keywords
MOSFET; ageing; leakage currents; scanning electron microscopy; semiconductor device reliability; silicon compounds; wide band gap semiconductors; MOSFET; SiC; aging test; electrical parameters; focused ion beam cut; gate leakage current; gate oxide degradation; gate structure; health predictions; health state; realistic switching conditions; reliability issues; runaway parameter; scanning electron microscopy pictures; Aging; Degradation; Leakage currents; MOSFET; Reliability; Silicon carbide; Silicon carbide; aging test; failure mechanism; oxide degradation; oxide degradation.; power MOSFET; reliability; switching;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2014.2361674
Filename
6936883
Link To Document