• DocumentCode
    12872
  • Title

    Gate Oxide Degradation of SiC MOSFET in Switching Conditions

  • Author

    Ouaida, Remy ; Berthou, Maxime ; Leon, Javier ; Perpina, Xavier ; Oge, Sebastien ; Brosselard, P. ; Joubert, Charles

  • Author_Institution
    Lab. Ampere, Univ. de Lyon, Villeurbanne, France
  • Volume
    35
  • Issue
    12
  • fYear
    2014
  • fDate
    Dec. 2014
  • Firstpage
    1284
  • Lastpage
    1286
  • Abstract
    Under realistic switching conditions, SiC MOSFETs reliability issues remain as a challenge that requires further investigation. In this letter, a specific aging test has been developed to monitor and characterize the electrical parameters of the SiC MOSFET. This allows estimations of the health state and predictions of the remaining lifetime prior to its failure. The gate leakage current seems to be a relevant runaway parameter just before failure. This leakage indicates deterioration of the gate structure. This hypothesis has been validated through analysis of scanning electron microscopy pictures, with a focused ion beam cut showing cracks within the polysilicon.
  • Keywords
    MOSFET; ageing; leakage currents; scanning electron microscopy; semiconductor device reliability; silicon compounds; wide band gap semiconductors; MOSFET; SiC; aging test; electrical parameters; focused ion beam cut; gate leakage current; gate oxide degradation; gate structure; health predictions; health state; realistic switching conditions; reliability issues; runaway parameter; scanning electron microscopy pictures; Aging; Degradation; Leakage currents; MOSFET; Reliability; Silicon carbide; Silicon carbide; aging test; failure mechanism; oxide degradation; oxide degradation.; power MOSFET; reliability; switching;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2014.2361674
  • Filename
    6936883