DocumentCode :
12872
Title :
Gate Oxide Degradation of SiC MOSFET in Switching Conditions
Author :
Ouaida, Remy ; Berthou, Maxime ; Leon, Javier ; Perpina, Xavier ; Oge, Sebastien ; Brosselard, P. ; Joubert, Charles
Author_Institution :
Lab. Ampere, Univ. de Lyon, Villeurbanne, France
Volume :
35
Issue :
12
fYear :
2014
fDate :
Dec. 2014
Firstpage :
1284
Lastpage :
1286
Abstract :
Under realistic switching conditions, SiC MOSFETs reliability issues remain as a challenge that requires further investigation. In this letter, a specific aging test has been developed to monitor and characterize the electrical parameters of the SiC MOSFET. This allows estimations of the health state and predictions of the remaining lifetime prior to its failure. The gate leakage current seems to be a relevant runaway parameter just before failure. This leakage indicates deterioration of the gate structure. This hypothesis has been validated through analysis of scanning electron microscopy pictures, with a focused ion beam cut showing cracks within the polysilicon.
Keywords :
MOSFET; ageing; leakage currents; scanning electron microscopy; semiconductor device reliability; silicon compounds; wide band gap semiconductors; MOSFET; SiC; aging test; electrical parameters; focused ion beam cut; gate leakage current; gate oxide degradation; gate structure; health predictions; health state; realistic switching conditions; reliability issues; runaway parameter; scanning electron microscopy pictures; Aging; Degradation; Leakage currents; MOSFET; Reliability; Silicon carbide; Silicon carbide; aging test; failure mechanism; oxide degradation; oxide degradation.; power MOSFET; reliability; switching;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2014.2361674
Filename :
6936883
Link To Document :
بازگشت