DocumentCode
1287358
Title
Elementary scattering theory of the Si MOSFET
Author
Lundstrom, Mark
Author_Institution
Dept. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
Volume
18
Issue
7
fYear
1997
fDate
7/1/1997 12:00:00 AM
Firstpage
361
Lastpage
363
Abstract
A simple one-flux scattering theory of the silicon MOSFET is introduced. Current-voltage (I-V) characteristics are expressed in terms of scattering parameters rather than a mobility. For long-channel transistors, the results reduce to conventional drift-diffusion theory, but they also apply to devices in which the channel length is comparable to or even shorter than the mean-free-path. The results indicate that for very short channels the transconductance is limited by carrier injection from the source. The theory also indicates that evaluation of the drain current in short-channel MOSFETs is a near-equilibrium transport problem, even though the channel electric field is large in magnitude and varies rapidly in space.
Keywords
MOSFET; S-parameters; elemental semiconductors; semiconductor device models; silicon; Si; carrier injection; current-voltage characteristics; drain current; drift-diffusion theory; long-channel transistor; near-equilibrium transport; one-flux scattering theory; scattering parameters; short-channel transistor; silicon MOSFET; transconductance; Backscatter; Bipolar transistors; Electrons; MOSFET circuits; Scattering parameters; Silicon; Steady-state; Surface treatment; Threshold voltage; Transconductance;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.596937
Filename
596937
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