Title :
Control of Bragg grating resonant wavelength through its dependence on the effective index of a waveguide
Author :
Bradley, Eric M. ; Yu, P.K.L. ; Mathis, R.F.
Author_Institution :
Tetra Tech Data Syst., Carlsbad, CA, USA
fDate :
7/1/1997 12:00:00 AM
Abstract :
Fabrication tolerances for control of the Bragg wavelength of gratings in waveguides are studied. Techniques are demonstrated to hold the period of the grating constant to ±0.04 nm over the majority of the exposed wafer area, and ridge waveguides fabricated with standard thin film process equipment are found to have Bragg wavelengths constant to within ±0.2 nm. Additionally, adjacent ridges with differing widths are written in a single photomask/etch process step and found to controllably shift the Bragg wavelength over a 10-20-nm band suitable for a distributed Bragg reflector (DBR) laser array or a monolithic comb filter for wavelength division multiplexing (WDM) filtering/routing arrays
Keywords :
diffraction gratings; distributed Bragg reflector lasers; integrated optics; optical fabrication; optical variables control; optical waveguide filters; refractive index; ridge waveguides; semiconductor laser arrays; waveguide lasers; wavelength division multiplexing; Bragg grating resonant wavelength control; Bragg wavelength shift; DBR laser array; WDM filtering/routing arrays; fabrication tolerances; monolithic comb filter; ridge waveguides; single photomask/etch process step; waveguide effective index dependence; wavelength division multiplexing; Bragg gratings; Distributed Bragg reflectors; Etching; Filters; Optical arrays; Optical control; Optical device fabrication; Resonance; Transistors; Wavelength division multiplexing;
Journal_Title :
Lightwave Technology, Journal of
