DocumentCode :
1287834
Title :
Recent developments in micromachined silicon
Author :
Moore, D.F. ; Syms, R.R.A.
Author_Institution :
Dept. of Eng., Cambridge Univ., UK
Volume :
11
Issue :
6
fYear :
1999
fDate :
12/1/1999 12:00:00 AM
Firstpage :
261
Lastpage :
270
Abstract :
This paper provides a review, directed at scientists and engineers concerned with microsystems technology, of advances in microelectromechanical systems (MEMS). The emphasis is on silicon technology, where the electrical properties of the material are exploited in circuitry and the mechanical properties are used in sensor and microstructure applications. Developments in surface micromachining are discussed, and applications in sensors, microelectronic devices, vacuum microanalysis systems, microfluidics, and optoelectronic subsystems are reviewed. Some emerging technologies are assessed and promising new research directions are identified
Keywords :
chemical analysis; electric properties; elemental semiconductors; integrated circuit manufacture; integrated optoelectronics; mechanical properties; microfluidics; micromachining; micromechanical devices; monolithic integrated circuits; sensors; silicon; Si; electrical properties; mechanical properties; microelectromechanical systems; microelectronic devices; microfabrication technology; microfluidics; micromachined silicon; microsystems technology; optoelectronic subsystems; research; sensor applications; silicon technology; surface micromachining; thin-film deposition; vacuum microanalysis systems;
fLanguage :
English
Journal_Title :
Electronics & Communication Engineering Journal
Publisher :
iet
ISSN :
0954-0695
Type :
jour
DOI :
10.1049/ecej:19990603
Filename :
815893
Link To Document :
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