• DocumentCode
    1287841
  • Title

    The Effect of Self-Heating in LDMOSFET Expansion Regime

  • Author

    Chou, Hsueh-Liang ; Ng, Jacky C W ; Liou, Ruey-Hsin ; Jong, Yu-Chang ; Tuan, Hsiao-Chin ; Huang, Chih-Fang ; Gong, Jeng

  • Author_Institution
    Dept. of Electr. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
  • Volume
    59
  • Issue
    11
  • fYear
    2012
  • Firstpage
    3042
  • Lastpage
    3047
  • Abstract
    In this paper, it is the first time that the effect of self-heating of LDMOS transistors operating in the so-called expansion regime of the output characteristics is studied. Experimental characterization and numerical simulations are used to demonstrate that, in order to explain the origin of the current enhancement phenomenon observed in the output characteristics of LDMOS transistors biased at high gate and drain voltages (which is named as the expansion regime), the thermal effect of the device self-heating, in addition to the proposed intrinsic MOSFET saturation, has to be considered. This is supported by analyzing the temperature, charged carrier velocity, impact ionization rate, and electric field at different positions in the LDMOS transistors biased at different gate and drain voltages.
  • Keywords
    MOSFET; impact ionisation; LDMOS transistor; LDMOSFET expansion regime; charged carrier velocity; drain voltage; electric field; gate voltage; impact ionization rate; self-heating effect; temperature; thermal effect; Impact ionization; Isothermal processes; Logic gates; MOSFET circuits; Temperature; Temperature measurement; Transistors; Current enhancement; Kirk effect; LDMOS; expansion regime; impact ionization; isothermal simulation; nonisothermal simulation; reduced surface field (RESURF); self-heating; thermal effect;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2012.2214036
  • Filename
    6307837