DocumentCode
1288127
Title
Electrical characteristics and model for recessed channel fin field-effect transistor
Author
Kim, Kunsu ; Yoshida, Manabu ; Kahng, J.-R. ; Moon, J.-S. ; Roh, Youngsu
Author_Institution
DRAM Core Technol. Lab., Samsung Electron. Co., Hwasung, South Korea
Volume
46
Issue
16
fYear
2010
Firstpage
1141
Lastpage
1143
Abstract
The recessed channel fin field-effect transistor (RC-FinFET) has been developed as a future DRAM cell transistor. A recess-channel structure is applied to the FinFET to form a RC-FinFET. A three series-connected transistor model is proposed to understand the electrical characteristics. The RC-FinFET is considered to be a serial connection of three transistors consisting of one bottom transistor and two vertical transistors. The electrical characteristics of the RC-FinFET are compared with the normal FinFET and recessed-channel-array transistor (RCAT). The short channel immunity of the RC-FinFET is better than the normal FinFET and RCAT.
Keywords
DRAM chips; MOSFET; DRAM cell transistor; FinFET; electrical characteristics; recessed channel fin field-effect transistor; recessed-channel-array transistor; short channel immunity; three series-connected transistor model;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el.2010.0727
Filename
5542578
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