• DocumentCode
    1288127
  • Title

    Electrical characteristics and model for recessed channel fin field-effect transistor

  • Author

    Kim, Kunsu ; Yoshida, Manabu ; Kahng, J.-R. ; Moon, J.-S. ; Roh, Youngsu

  • Author_Institution
    DRAM Core Technol. Lab., Samsung Electron. Co., Hwasung, South Korea
  • Volume
    46
  • Issue
    16
  • fYear
    2010
  • Firstpage
    1141
  • Lastpage
    1143
  • Abstract
    The recessed channel fin field-effect transistor (RC-FinFET) has been developed as a future DRAM cell transistor. A recess-channel structure is applied to the FinFET to form a RC-FinFET. A three series-connected transistor model is proposed to understand the electrical characteristics. The RC-FinFET is considered to be a serial connection of three transistors consisting of one bottom transistor and two vertical transistors. The electrical characteristics of the RC-FinFET are compared with the normal FinFET and recessed-channel-array transistor (RCAT). The short channel immunity of the RC-FinFET is better than the normal FinFET and RCAT.
  • Keywords
    DRAM chips; MOSFET; DRAM cell transistor; FinFET; electrical characteristics; recessed channel fin field-effect transistor; recessed-channel-array transistor; short channel immunity; three series-connected transistor model;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el.2010.0727
  • Filename
    5542578