DocumentCode :
1288127
Title :
Electrical characteristics and model for recessed channel fin field-effect transistor
Author :
Kim, Kunsu ; Yoshida, Manabu ; Kahng, J.-R. ; Moon, J.-S. ; Roh, Youngsu
Author_Institution :
DRAM Core Technol. Lab., Samsung Electron. Co., Hwasung, South Korea
Volume :
46
Issue :
16
fYear :
2010
Firstpage :
1141
Lastpage :
1143
Abstract :
The recessed channel fin field-effect transistor (RC-FinFET) has been developed as a future DRAM cell transistor. A recess-channel structure is applied to the FinFET to form a RC-FinFET. A three series-connected transistor model is proposed to understand the electrical characteristics. The RC-FinFET is considered to be a serial connection of three transistors consisting of one bottom transistor and two vertical transistors. The electrical characteristics of the RC-FinFET are compared with the normal FinFET and recessed-channel-array transistor (RCAT). The short channel immunity of the RC-FinFET is better than the normal FinFET and RCAT.
Keywords :
DRAM chips; MOSFET; DRAM cell transistor; FinFET; electrical characteristics; recessed channel fin field-effect transistor; recessed-channel-array transistor; short channel immunity; three series-connected transistor model;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2010.0727
Filename :
5542578
Link To Document :
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