Title :
Physical modeling of NBTI: From individual defects to devices
Author :
Rzepa, G. ; Goes, W. ; Rott, G. ; Rott, Karsten ; Karner, M. ; Kernstock, C. ; Kaczer, Ben ; Reisinger, H. ; Grasser, Tibor
Author_Institution :
Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
Abstract :
Given the rapid recovery of the degradation induced by bias-temperature stress, the understanding and modeling of NBTI has been a challenge for nearly half a century. With the introduction of the time-dependent defect spectroscopy (TDDS), NBTI could be studied at the single defect level, confirming that it is dominated by a collection of first-order reactions rather then the previously invoked reaction-diffusion mechanism. The most intriguing feature of these first-order processes is the wide distribution of their time constants, which can be visualized in capture/emission time (CET) maps. In the following we clarify the microscopic link between individual defects seen in TDDS studies and the response of a large ensemble visible in the CET maps. In particular, we show how the distribution of the individual defect parameters can be extracted from measurements on large-area devices.
Keywords :
internal stresses; reaction-diffusion systems; semiconductor device models; semiconductor device reliability; NBTI; capture/emission time maps; negative bias and temperature-induced instabilities; physical modeling; single defect level; time-dependent defect spectroscopy; Calibration; Degradation; Logic gates; Stress; Stress measurement; Temperature measurement; Voltage measurement;
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2014 International Conference on
Conference_Location :
Yokohama
Print_ISBN :
978-1-4799-5287-8
DOI :
10.1109/SISPAD.2014.6931568