DocumentCode :
128847
Title :
Investigation of retention behavior for 3D charge trapping NAND flash memory by 2D self-consistent simulation
Author :
Zhiyuan Lun ; Shuhuan Liu ; Yuan He ; Yi Hou ; Kai Zhao ; Gang Du ; Xiaoyan Liu ; Yi Wang
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
fYear :
2014
fDate :
9-11 Sept. 2014
Firstpage :
141
Lastpage :
144
Abstract :
This paper presents a comprehensive investigation on retention behavior for three-dimensional charge trapping NAND flash memory by two-dimensional self-consistent simulation. Major physical mechanisms, including tunneling, charge trapping and de-trapping process as well as drift-diffusion have been incorporated into the simulator. The developed simulator is able to describe the charge transport along the bitline and in vertical direction in the memory structure. This work aims to help to design and optimize three-dimensional stackable CT-NAND architectures.
Keywords :
NAND circuits; flash memories; 2D self-consistent simulation; 3D charge trapping; 3D stackable CT-NAND architectures; NAND flash memory; charge de-trapping process; charge transport; charge trapping process; drift-diffusion; physical mechanisms; retention behavior; Electron traps; Flash memories; Logic gates; Solid modeling; Three-dimensional displays; Tunneling; NAND flash; charge trapping; retention; two-dimensional simulation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2014 International Conference on
Conference_Location :
Yokohama
ISSN :
1946-1569
Print_ISBN :
978-1-4799-5287-8
Type :
conf
DOI :
10.1109/SISPAD.2014.6931583
Filename :
6931583
Link To Document :
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