• DocumentCode
    128879
  • Title

    Numerical simulation of current noise caused by potential fluctuation in nanowire FET with an oxide trap

  • Author

    Furubayashi, Yuki ; Ogawa, Michiko ; Souma, Satofumi

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Kobe Univ., Kobe, Japan
  • fYear
    2014
  • fDate
    9-11 Sept. 2014
  • Firstpage
    201
  • Lastpage
    204
  • Abstract
    We present a theoretical study on the temporal current fluctuation in nanowire FET caused by the presence of a single gate oxide trap through the Coulomb interaction. Our calculations based on the scattering theoretical formulation of the current noise showed that the presence of the trap level in the gate insulator gives rise to the enhancement of the noise at a specific gate voltage. The peak position of the noise is related to the capacitive coupling strengths of the trap to the channel and the gate electrode, suggesting that the current noise can be used to measure such physical quantities.
  • Keywords
    MOSFET; current fluctuations; nanoelectronics; nanowires; noise; semiconductor device models; Coulomb interaction; capacitive coupling strengths; current noise; gate electrode; gate insulator; nanowire FET; numerical simulation; single gate oxide trap; temporal current fluctuation; trap level; Electric potential; Electron traps; Electrostatics; Equations; Logic gates; Noise; Scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2014 International Conference on
  • Conference_Location
    Yokohama
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4799-5287-8
  • Type

    conf

  • DOI
    10.1109/SISPAD.2014.6931598
  • Filename
    6931598