DocumentCode :
128897
Title :
Modeling self-heating effects in AlGaN/GaN electronic devices during static and dynamic operation mode
Author :
Tallarico, Andrea Natale ; Magnone, Paolo ; Sangiorgi, Enrico ; Fiegna, Claudio
Author_Institution :
DEI-Guglielmo Marconi, Univ. of Bologna, Cesena, Italy
fYear :
2014
fDate :
9-11 Sept. 2014
Firstpage :
233
Lastpage :
236
Abstract :
In this paper, we present a study of the self-heating effects in GaN-based power devices during static and dynamic operation mode by means of Sentaurus TCAD. A physical model interface (PMI), accounting for the temperature dependence of the thermal boundary resistance (TBR), has been implemented in the simulator in order to realistically model self-heating effects. In particular, we take into account for the TBR associated to the nucleation layer between GaN and SiC substrate. Moreover, the thermal contribution of the mutual heating among adjacent devices has been considered. Finally, we have investigated the influence of the temperature on the surface charges trapping and de-trapping phenomena showing two different traps occupancy transients. While one of the two occurs also in the isothermal condition, the second one is temperature activated.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; power HEMT; semiconductor device models; thermal resistance; wide band gap semiconductors; AlGaN-GaN; HEMT; PMI; Sentaurus TCAD; SiC; TBR; adjacent devices; dynamic operation mode; electronic devices; isothermal condition; mutual heating; nucleation layer; physical model interface; power devices; self-heating effect modelling; static operation mode; surface charge de-trapping phenomena; surface charge trapping; temperature dependence; thermal boundary resistance; thermal contribution; trap occupancy transients; Aluminum gallium nitride; Charge carrier processes; Gallium nitride; Substrates; Thermal resistance; Transient analysis; GaN HEMT; drain-lag measurement; mutual-heating; self-heating; surface trapping/de-trapping charges; thermal boundary resistance (TBR);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2014 International Conference on
Conference_Location :
Yokohama
ISSN :
1946-1569
Print_ISBN :
978-1-4799-5287-8
Type :
conf
DOI :
10.1109/SISPAD.2014.6931606
Filename :
6931606
Link To Document :
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