DocumentCode :
1289392
Title :
Analysis and control of floating-body bipolar effects in fully depleted submicrometer SOI MOSFET´s
Author :
Choi, Jin-young ; Fossum, Jerry G.
Author_Institution :
Dept. of Electr. Eng., Florida Univ., Gainesville, FL, USA
Volume :
38
Issue :
6
fYear :
1991
fDate :
6/1/1991 12:00:00 AM
Firstpage :
1384
Lastpage :
1391
Abstract :
Floating-body effects triggered by impact ionization in fully depleted submicrometer silicon-on-insulator (SOI) MOSFETs are analyzed based on two-dimensional device simulations. The parasitic bipolar junction transistor (BJT) effects are emphasized, but the kink effect and its disappearance in the fully depleted device are first explained physically to provide a basis for the BJT analysis. The results of simulations of the BJT-induced breakdown and latch phenomena are given, and parametric dependences are examined to give physical insight for optimal design. The analysis further relates the DC breakdown and latch mechanisms in the fully depleted submicrometer SOI MOSFET to actual BJT-related problems in an operating SOI CMOS circuit. A comprehensive understanding of the floating-body effects is attained, and a device design to control them utilizing a lightly doped source (LDS) is suggested and shown to be feasible
Keywords :
insulated gate field effect transistors; semiconductor device models; semiconductor-insulator boundaries; 2D model; BJT-induced breakdown; BJT-related problems; DC breakdown; LDS; device design; floating-body bipolar effects; floating-body effects; fully depleted device; impact ionization; kink effect; latch mechanisms; latch phenomena; lightly doped source; operating SOI CMOS circuit; optimal design; parametric dependences; parasitic bipolar junction transistor; submicrometer SOI MOSFET; submicron; Analytical models; Degradation; Dielectrics; Electric breakdown; Hot carriers; Latches; Lighting control; MOSFET circuits; Semiconductor films; Silicon;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.81630
Filename :
81630
Link To Document :
بازگشت