Reactor modeling of magnetically enhanced capacitive RF discharge

Author

Park, Jong Chul ; Kang, Bongkoo

Author_Institution

Dept. of Electr. Eng., Pohang Univ. of Sci. & Technol., South Korea

Volume

25

Issue

3

fYear

1997

fDate

6/1/1997 12:00:00 AM

Firstpage

499

Lastpage

506

Abstract

Magnetic and collisional effects on capacitive radio frequency (RF) discharges for magnetically enhanced reactive ion etching (MERIE) are investigated. Using simplified plasma and sheath models, a collisional magnetic-sheath equation that governs the sheath dynamics under a de magnetic field crossed with a sinusoidal RF electric field is obtained. The sheath equation includes global effects of the bulk plasma. Together with the power-balance equation and the particle-conservation equation, the sheath equation is used to extract a circuit model and predict the electrical behavior of MERIE reactors. Numerical results on the plasma density and the power in MERIE reactors agree well with reported experimental results and the circuit model describes the repeated discharge properties well

Keywords

high-frequency discharges; plasma collision processes; plasma density; plasma sheaths; reactors (electric); semiconductor device manufacture; sputter etching; MERIE reactors; bulk plasma; capacitive radiofrequency discharges; circuit model; collisional effects; electrical behavior; global effects; magnetic effects; magnetic-sheath equation; magnetically enhanced capacitive RF discharge; magnetically enhanced reactive ion etching; particle-conservation equation; plasma density; power-balance equation; reactor modeling; sheath models; sinusoidal RF electric field; Circuits; Equations; Etching; Inductors; Magnetic fields; Plasma applications; Plasma density; Plasma sheaths; Predictive models; Radio frequency;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.597265

Filename

597265