Title :
Properties of Propagation of Electromagnetic Wave in a Multilayer Radar-Absorbing Structure With Plasma- and Radar-Absorbing Material
Author :
Yuan, Cheng-Xun ; Zhou, Zhong-Xiang ; Zhang, Jingwen W. ; Xiang, Xiao-Li ; Feng, Yue ; Sun, Hong-Guo
Author_Institution :
Phys. Dept., Harbin Inst. of Technol., Harbin, China
Abstract :
A multilayer radar-absorbing structure with plasma- and radar-absorbing material (RAM) is established to investigate the stealth mechanisms of the multilayer absorber. The method of impedance transformation with multiple dielectrics is used to analyze the propagation of electromagnetic (EM) waves in the multilayer structure. The dependences of EM waves attenuation on the parameters of the plasma and RAMs are provided. The numerical results indicate that generally speaking, the joint attention effect of RAM and plasma is better than the effect of either RAM or plasma solely. The attenuation of an EM wave in the structure is strongly affected by: a) the characteristics of RAMs; b) the width of the plasma layer; c) the parameters of the outer layer material; d) the electron density of the plasma; and e) the collision frequency between electrons and neutrals. It is demonstrated that detailed numerical analyses are useful in practical applications pertaining to the control of the reflection of EM waves through a multilayer radar-absorbing structure with plasma and RAMs.
Keywords :
multilayers; numerical analysis; plasma boundary layers; plasma collision processes; plasma density; plasma electromagnetic wave propagation; radar absorbing materials; collision frequency; electromagnetic wave propagation; electron density; impedance transformation; multilayer radar-absorbing structure; numerical analyses; plasma-absorbing material; radar-absorbing material; stealth mechanisms; Attenuation; Force; Impedance; Nonhomogeneous media; Plasmas; Random access memory; Absorbing media; attenuation; electromagnetic propagation in absorbing media; electromagnetic propagation in plasma media; impedance;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2011.2160285