• DocumentCode
    1290611
  • Title

    205-GHz (Al,In)N/GaN HEMTs

  • Author

    Sun, Haifeng ; Alt, Andreas R. ; Benedickter, Hansruedi ; Feltin, Eric ; Carlin, Jean-François ; Gonschorek, Marcus ; Grandjean, Nicolas ; Bolognesi, C.R.

  • Author_Institution
    Millimeter-Wave Electron. Group, ETH Zurich, Zürich, Switzerland
  • Volume
    31
  • Issue
    9
  • fYear
    2010
  • Firstpage
    957
  • Lastpage
    959
  • Abstract
    We report 55-nm gate AlInN/GaN high-electron-mobility transistors (HEMTs) featuring a short-circuit current gain cutoff frequency of fT = 205 GHz at room temperature, a new record for GaN-based HEMTs. The devices source a maximum current density of 2.3 A/mm at VGS = 0 V and show a measured transconductance of 575 mS/mm, which is the highest value reported to date for nonrecessed gate nitride HEMTs. Comparison to state-of-the-art thin-barrier AlGaN/GaN HEMTs suggests that AlInN/GaN devices benefit from an advantageous channel velocity under high-field transport conditions.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; indium compounds; millimetre wave field effect transistors; wide band gap semiconductors; AlInN-GaN; HEMT; advantageous channel velocity; frequency 205 GHz; high electron mobility transistors; high field transport condition; maximum current density; short circuit current gain cutoff frequency; size 55 nm; temperature 293 K to 298 K; Aluminum gallium nitride; Current density; Current measurement; Cutoff frequency; Density measurement; Gallium nitride; HEMTs; Logic gates; MODFETs; Temperature; Transconductance; AlInN/GaN; high-electron-mobility transistor (HEMT); millimeter-wave transistors;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2010.2055826
  • Filename
    5545347