• DocumentCode
    1291398
  • Title

    Direct-write pyrolytic laser deposition

  • Author

    Allen, Susan Davis

  • Volume
    2
  • Issue
    1
  • fYear
    1986
  • Firstpage
    32
  • Lastpage
    36
  • Abstract
    Direct-wire pyrolytic laser deposition is capable of maskless pattern generation of a wide range of materials of interest to the semiconductor device industry. Effects that influence the deposition rate and resolution in direct-write thermal deposition are discussed for metallic film deposition from gas and solid phases.
  • Keywords
    chemical vapour deposition; laser beam applications; metallic thin films; pyrolysis; semiconductor technology; CVD; deposition rate; direct write pyrolytic laser deposition; direct-write thermal deposition; maskless pattern generation; metallic film deposition; resolution; semiconductor device industry; Chemical lasers; Films; Gas lasers; Semiconductor lasers; Substrates;
  • fLanguage
    English
  • Journal_Title
    Circuits and Devices Magazine, IEEE
  • Publisher
    ieee
  • ISSN
    8755-3996
  • Type

    jour

  • DOI
    10.1109/MCD.1986.6311768
  • Filename
    6311768
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1291398