DocumentCode
1293927
Title
Tunnel Diode Modeling, Including Nonlocal Trap-Assisted Tunneling: A Focus on III–V Multijunction Solar Cell Simulation
Author
Baudrit, Mathieu ; Algora, Carlos
Author_Institution
Inst. de Energia Solar, Univ. Politec. de Madrid, Madrid, Spain
Volume
57
Issue
10
fYear
2010
Firstpage
2564
Lastpage
2571
Abstract
Multijunction solar cells (MJCs) based on III-V semiconductors constitute the state-of-the-art approach for high-efficiency solar energy conversion. These devices, consisting of a stack of various solar cells, are interconnected by tunnel diodes. Reliable simulations of the tunnel diode behavior are still a challenge for solar cell applications. In this paper, a complete description of the model implemented in Silvaco ATLAS is shown, demonstrating the importance of local and nonlocal trap-assisted tunneling. We also explain how the measured doping profile and the metalization-induced series resistance influence the behavior of the tunnel diodes. Finally, we detail the different components of the series resistance and show that this can help extract the experimental voltage drop experienced by an MJC due to the tunnel junction. The value of this intrinsic voltage is important for achieving high efficiencies at concentrations near 1000 suns.
Keywords
III-V semiconductors; semiconductor device models; solar cells; solar energy conversion; tunnel diodes; tunnelling; III-V multijunction solar cell simulation; III-V semiconductors; Silvaco ATLAS; doping profile; high-efficiency solar energy conversion; local trap-assisted tunneling; metalization-induced series resistance; nonlocal trap-assisted tunneling; series resistance; tunnel diode modeling; Absorption; Electron traps; Energy barrier; Junctions; MOSFETs; Photovoltaic cells; Quantum mechanics; Resistance; Semiconductor diodes; Semiconductor process modeling; Solar energy; Sun; Tunneling; Voltage; III–V semiconductors; simulation; solar cell; tunnel diode;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2010.2061771
Filename
5546937
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