DocumentCode :
1293960
Title :
Use of the radiation-induced charge neutralization mechanism to achieve annealing of 0.35 /spl mu/m SRAMs
Author :
Quittard, O. ; Joffre, F. ; Brisset, C. ; Oudéa, C. ; Saigné, F. ; Dusseau, L. ; Fesquet, J. ; Gasiot, J.
Author_Institution :
CEA, Centre d´´Etudes Nucleaires de Saclay, Gif-sur-Yvette, France
Volume :
46
Issue :
6
fYear :
1999
Firstpage :
1633
Lastpage :
1639
Abstract :
Irradiation of electronic devices has varying impact on their electrical characteristics, according to the concomitant bias scenario. Under bias, there is a process of continuous degradation; but recovery will occur if subsequent irradiation is performed without bias voltage. This phenomenon, known as "Radiation-Induced Charge Neutralization" (RICN), was studied by us, using individual components (inverters) and complex integrated circuits (0.35 /spl mu/m static random access memories). Our study focused on the effects of irradiation and bias on electronic component response.
Keywords :
SRAM chips; annealing; radiation hardening (electronics); 0.35 micron; CMOS inverter; SRAM; annealing; bias voltage; electrical characteristics; electronic device; integrated circuit; radiation-induced charge neutralization; Annealing; CMOS technology; Circuit testing; Degradation; Electric variables; Inverters; MOS devices; MOSFETs; Random access memory; Voltage;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.819132
Filename :
819132
Link To Document :
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