Title :
Characterization of elastic properties of SiO2 thin films by ultrasonic microscopy
Author :
Omori, Tatsuya ; Sakamoto, Kazumitsu ; Suzuki, Satoshi ; Kushibiki, Jun-ichi ; Matsuda, Shodai ; Hashimoto, Ken-ya
Author_Institution :
Grad. Sch. of Eng., Chiba Univ., Chiba, Japan
Abstract :
This paper describes characterization of elastic properties of SiO2 films by the Line-Focus-Beam (LFB) ultrasonic microscopy. SiO2 films with 1 μm thickness were deposited on Si (001) substrates by sputtering or CVD with two different deposition conditions each, and the water-loaded SAW velocity on these samples was measured. Large variation of elastic properties was clearly observed among four specimens. Furthermore, anisotropy in the elastic properties was also observed. Namely, those normal to the surface seem different from those along the surface considerably. This anisotropy might be induced during the deposition.
Keywords :
acoustic microscopy; chemical vapour deposition; elasticity; silicon compounds; sputter deposition; thin films; ultrasonic materials testing; Line-Focus-Beam ultrasonic microscopy; SiO2; elastic properties; sputtering; thin films; water loaded SAW velocity; Microscopy; Silicon; Substrates; Surface acoustic waves; Velocity measurement;
Conference_Titel :
Ultrasonics Symposium (IUS), 2014 IEEE International
Conference_Location :
Chicago, IL
DOI :
10.1109/ULTSYM.2014.0219
