DocumentCode :
1294903
Title :
Single Fermi Level Thin-Film CMOS on Glass: The Behavior of Enhancement-Mode PMOSFETs From Cutoff Through Accumulation
Author :
Nassar, Christopher James ; Williams, Carlo A Kosik ; Dawson-Elli, David ; Bowman, Robert John
Author_Institution :
Dept. of Electr. Eng., Rochester Inst. of Technol., Rochester, NY, USA
Volume :
56
Issue :
9
fYear :
2009
Firstpage :
1974
Lastpage :
1979
Abstract :
A device model which describes the behavior of thin-film transistors fabricated in crystalline silicon on glass is introduced. The dc current-voltage characteristics of fully depleted thin-film silicon p-channel enhancement-mode MOSFETs operated in accumulation is provided. Physically derived expressions are presented for drain current in the accumulation and depletion regions which include the correct dependence on drain voltage, film thickness, and doping level. AC-infin model is realized from cutoff to accumulation by using an interpolant around the flatband voltage and a hyperbolic tangent blending function. The device model shows excellent agreement with measured results for output, transfer, and transconductance characteristics. A compact circuit simulation model has also been implemented in the Spectre circuit simulator using Verilog-A.
Keywords :
Fermi level; circuit simulation; doping profiles; elemental semiconductors; glass; hardware description languages; power MOSFET; semiconductor device models; semiconductor doping; semiconductor thin films; silicon; thin film transistors; AC-infin model; Fermi level; Si-SiO2; SiO2; Spectre circuit simulator; Verilog-A; circuit simulation model; crystalline silicon; dc current-voltage characteristics; device model; doping level; drain current; drain voltage; enhancement-mode PMOSFETs; film thickness; flatband voltage; fully depleted thin-film silicon p-channel enhancement-mode MOSFETs; glass; hyperbolic tangent blending function; thin-film CMOS; thin-film transistors; transconductance characteristics; Circuit simulation; Crystallization; Current-voltage characteristics; Glass; MOSFETs; Semiconductor device modeling; Semiconductor process modeling; Silicon; Thin film transistors; Voltage; CMOS; modeling; semiconductor modeling; silicon-on-insulator technology; thin-film transistors;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2009.2026111
Filename :
5200328
Link To Document :
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