Title :
Waveguide fabrication for integrated optics by electron beam irradiation of silica
Author :
Barbier, D. ; Green, Mino ; Madden, S.J.
Author_Institution :
Dept. of Electr. Eng., Imperial Coll., London, UK
fDate :
6/1/1991 12:00:00 AM
Abstract :
The electron beam process is used to make a variety of optical waveguides in silica. The process uses beam energies in the vicinity of 25 keV to make monomode through to three-moded slab waveguides from 2 to 7-μm deep with peak-index variations ranging from 10-3 to 10-2. Different types of silica were irradiated and the lowest measured losses were 0.3 dB/cm. It is shown that the major loss process arises from surface imperfections at the air/silica interface. The guides are stable up to 400°C. The results show that the use of electron irradiation to increase the refraction index of silica has considerable potential in the technology of integrated optics
Keywords :
electron beam effects; integrated optics; optical waveguides; optical workshop techniques; refractive index; silicon compounds; 25 keV; SiO2; air/silica interface; beam energies; electron beam irradiation; integrated optics; major loss process; optical waveguides; peak-index variations; refraction index; surface imperfections; three-moded slab waveguides; waveguide fabrication; Electron beams; Electron optics; Integrated optics; Loss measurement; Optical device fabrication; Optical losses; Optical refraction; Optical waveguides; Silicon compounds; Slabs;
Journal_Title :
Lightwave Technology, Journal of
