Title :
Electromigration noise measurements using a novel AC/DC wafer-level noise measurement system
Author :
Yassine, Abdullah M. ; Chen, Charles Tsong-Ming
Author_Institution :
Dept. of Electr. Eng., Univ. of South Florida, Tampa, FL, USA
fDate :
1/1/1997 12:00:00 AM
Abstract :
This paper presents a novel AC/DC noise measurement system. This system simultaneously uses a high DC current to generate 1/f2 noise (electromigration noise) in thin films and a low AC current to detect that noise. This new system allows us to separate the noise components of metal thin films and is more stable and sensitive than its predecessors
Keywords :
1/f noise; bridge instruments; electric noise measurement; electromigration; integrated circuit measurement; integrated circuit metallisation; integrated circuit testing; metallic thin films; 1/f2 noise; AC/DC wafer-level noise measurement system; electromigration noise measurements; high DC current; low AC current; metal thin films; Background noise; Battery charge measurement; Circuit noise; Current measurement; Electrical resistance measurement; Electromigration; Noise generators; Noise measurement; Power measurement; Semiconductor device noise;
Journal_Title :
Electron Devices, IEEE Transactions on
