DocumentCode :
1295477
Title :
Carrier injection by static induction mechanism in MLE-grown planar-doped barrier n+-i-p+-i-n+ structures
Author :
Liu, Y.X. ; Plotka, P. ; Suto, K. ; Oyama, Y. ; Nishizawa, J.
Author_Institution :
Dept. of Mater. Sci. & Eng., Tohoku Univ., Sendai, Japan
Volume :
44
Issue :
1
fYear :
1997
fDate :
1/1/1997 12:00:00 AM
Firstpage :
195
Lastpage :
197
Abstract :
The I-V characteristics of GaAs n+-i-p+-i-n + diode structures grown by MLE with source-drain distances from 500 Å to 950 Å have been measured at temperatures ranging from 77 K to 423 K. The analysis of experimental results indicates that the current flows over the static-induction-controlled potential barrier. On this basis, quantitative comparison with thermionic emission theory which assumes injection of ballistic electrons are made
Keywords :
III-V semiconductors; atomic layer epitaxial growth; gallium arsenide; high field effects; semiconductor diodes; thermionic electron emission; 500 to 950 A; 77 to 423 K; GaAs; I-V characteristics; MLE-grown structure; carrier injection; n+-i-p+-i-n+ structures; planar-doped barrier; static induction mechanism; static-induction-controlled potential barrier; Ballistic transport; Current measurement; Electrons; Gallium arsenide; Maximum likelihood estimation; Semiconductor diodes; Temperature distribution; Temperature measurement; Thermionic emission; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.554811
Filename :
554811
Link To Document :
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