DocumentCode
1295485
Title
Dependence of the injection current at lasing threshold on structure and losses in AlGaN/GaN lasers
Author
Shah, Pankaj ; Mitin, Vladimir
Author_Institution
Dept. of Electr. & Comput. Eng., Wayne State Univ., Detroit, MI, USA
Volume
44
Issue
1
fYear
1997
fDate
1/1/1997 12:00:00 AM
Firstpage
197
Lastpage
200
Abstract
We present calculations of the threshold current densities, Jth, in AlGaN/GaN double heterostructure lasers for different active region thickness, losses, and cavity lengths. Two-dimensional (2-D) numerical simulations indicate that for a 100-μm long cavity, a 0.1-μm thick active region gives the lowest Jth when only mirror losses are present. As losses increase, the minimum moves to thicker active regions. Jth versus optical loss plots demonstrate that with the high optical losses in the materials grown, it will be easier to induce lasing in thick active region structures. Results for AlGaAs/GaAs lasers presented for comparison, demonstrate that AlGaN/GaN lasers have higher Jth unless the active region is very thin
Keywords
III-V semiconductors; aluminium compounds; gallium compounds; laser cavity resonators; laser mirrors; optical losses; semiconductor lasers; 0.1 micron; 100 micron; AlGaN-GaN; active region thickness; cavity lengths; double heterostructure lasers; injection current; lasing threshold; mirror losses; numerical simulations; optical losses; thick active region structures; threshold current densities; Diodes; Electric variables measurement; Electrons; Equations; Gallium arsenide; Gallium nitride; Maximum likelihood estimation; Optical scattering; Temperature measurement; Thermionic emission;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.554812
Filename
554812
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