• DocumentCode
    1295485
  • Title

    Dependence of the injection current at lasing threshold on structure and losses in AlGaN/GaN lasers

  • Author

    Shah, Pankaj ; Mitin, Vladimir

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Wayne State Univ., Detroit, MI, USA
  • Volume
    44
  • Issue
    1
  • fYear
    1997
  • fDate
    1/1/1997 12:00:00 AM
  • Firstpage
    197
  • Lastpage
    200
  • Abstract
    We present calculations of the threshold current densities, Jth, in AlGaN/GaN double heterostructure lasers for different active region thickness, losses, and cavity lengths. Two-dimensional (2-D) numerical simulations indicate that for a 100-μm long cavity, a 0.1-μm thick active region gives the lowest Jth when only mirror losses are present. As losses increase, the minimum moves to thicker active regions. Jth versus optical loss plots demonstrate that with the high optical losses in the materials grown, it will be easier to induce lasing in thick active region structures. Results for AlGaAs/GaAs lasers presented for comparison, demonstrate that AlGaN/GaN lasers have higher Jth unless the active region is very thin
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; laser cavity resonators; laser mirrors; optical losses; semiconductor lasers; 0.1 micron; 100 micron; AlGaN-GaN; active region thickness; cavity lengths; double heterostructure lasers; injection current; lasing threshold; mirror losses; numerical simulations; optical losses; thick active region structures; threshold current densities; Diodes; Electric variables measurement; Electrons; Equations; Gallium arsenide; Gallium nitride; Maximum likelihood estimation; Optical scattering; Temperature measurement; Thermionic emission;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.554812
  • Filename
    554812