DocumentCode :
1295485
Title :
Dependence of the injection current at lasing threshold on structure and losses in AlGaN/GaN lasers
Author :
Shah, Pankaj ; Mitin, Vladimir
Author_Institution :
Dept. of Electr. & Comput. Eng., Wayne State Univ., Detroit, MI, USA
Volume :
44
Issue :
1
fYear :
1997
fDate :
1/1/1997 12:00:00 AM
Firstpage :
197
Lastpage :
200
Abstract :
We present calculations of the threshold current densities, Jth, in AlGaN/GaN double heterostructure lasers for different active region thickness, losses, and cavity lengths. Two-dimensional (2-D) numerical simulations indicate that for a 100-μm long cavity, a 0.1-μm thick active region gives the lowest Jth when only mirror losses are present. As losses increase, the minimum moves to thicker active regions. Jth versus optical loss plots demonstrate that with the high optical losses in the materials grown, it will be easier to induce lasing in thick active region structures. Results for AlGaAs/GaAs lasers presented for comparison, demonstrate that AlGaN/GaN lasers have higher Jth unless the active region is very thin
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; laser cavity resonators; laser mirrors; optical losses; semiconductor lasers; 0.1 micron; 100 micron; AlGaN-GaN; active region thickness; cavity lengths; double heterostructure lasers; injection current; lasing threshold; mirror losses; numerical simulations; optical losses; thick active region structures; threshold current densities; Diodes; Electric variables measurement; Electrons; Equations; Gallium arsenide; Gallium nitride; Maximum likelihood estimation; Optical scattering; Temperature measurement; Thermionic emission;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.554812
Filename :
554812
Link To Document :
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