DocumentCode
1296068
Title
Low Transparency Current Density and Low Internal Loss of 1060-nm InGaAs Laser With GaAsP–GaAs Superlattices as Strain-Compensated Layer
Author
Wan, C.T. ; Su, Y.K. ; Yu, H.C. ; Huang, C.Y. ; Lin, W.H. ; Chen, W.C. ; Tseng, H.C. ; Horng, J.B. ; Hu, C. ; Tsau, Seth
Author_Institution
Dept. of Electr. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
Volume
21
Issue
19
fYear
2009
Firstpage
1474
Lastpage
1476
Abstract
In this letter, the strained In0.22Ga0.78As-GaAs single quantum-well lasers grown by metal-organic vapor phase epitaxy were studied. The lasing wavelength of the fabricated InGaAs laser was 1056 nm, whereas the internal loss (alphai) and the transparency current density (Jtr) were 1.78 cm-1 and 40.2 A/cm2, respectively. By using the GaAsP-GaAs superlattices as strain-compensated layer, the lasing wavelength was 1052 nm, and the alphai and Jtr could be reduced to 0.63 cm-1 and 39.1 A/cm2, respectively. To the best of our knowledge, the Jtr was the lowest among the reported InGaAs lasers around 1060 nm.
Keywords
III-V semiconductors; gallium arsenide; indium compounds; quantum well lasers; GaAsP-GaAs; InGaAs; low internal loss; low transparency current density; metal-organic vapor phase epitaxy; quantum-well lasers; strain-compensated layer; superlattices; wavelength 1052 nm; wavelength 1056 nm; wavelength 1060 nm; InGaAs; lasers, metal–organic vapor phase epitaxy (MOVPE);
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/LPT.2009.2028654
Filename
5200510
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