DocumentCode :
1296182
Title :
A Model of the Gate Capacitance of Surrounding Gate Transistors: Comparison With Double-Gate MOSFETs
Author :
Ruiz, Francisco J Garcìa ; Tienda-Luna, Isabel Marìa ; Godoy, Andrés ; Donetti, Luca ; Gámiz, Francisco
Author_Institution :
Dept. de Electron. y Tecnol. de los Comput., Univ. de Granada, Granada, Spain
Volume :
57
Issue :
10
fYear :
2010
Firstpage :
2477
Lastpage :
2483
Abstract :
In this work, we develop a comprehensive model of the total gate capacitance (CG) of circular-cross-section surrounding gate transistors that accounts for both the insulator gate capacitance (Cins) and the inversion capacitance (Cinv). The accuracy of the model is checked with the results obtained from the numerical simulation of the structure. Using this model, we compare the CG/Cins ratio with that of double-gate (DG) transistors and study the degradation of the total gate capacitance of both devices as a function of the gate voltage and device size. It is shown that the CG/Cins ratio is higher in DGs, particularly for very small devices.
Keywords :
MOSFET; insulators; numerical analysis; semiconductor device models; circular-cross-section surrounding gate transistors; double-gate MOSFET; insulator gate capacitance; inversion capacitance; numerical simulation; total gate capacitance model; Capacitance; Character generation; Degradation; Electrostatics; Geometry; Insulation; Insulators; Logic gates; MOSFETs; Mathematical model; Numerical simulation; Quantum capacitance; Silicon; Silicon on insulator technology; Tin; Double gate (DG); gate capacitance; nanowires; quantum effects; semiconductor device modeling; silicon-on-insulator (SOI) technology; surrounding gate transistors (SGTs);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2010.2058630
Filename :
5549881
Link To Document :
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