DocumentCode
1297188
Title
DC magnetron sputtering of Y-Ba-Cu-O on Si(100)
Author
Raven, M.S.
Author_Institution
Dept. of Electr. & Electron Eng., Nottingham Univ.
Volume
24
Issue
6
fYear
1988
fDate
3/17/1988 12:00:00 AM
Firstpage
341
Lastpage
343
Abstract
A relatively simple DC magnetron sputtering technique is described which is used to deposit thin films of the compound Y-Ba-Cu-O on Si(100) substrates. The magnetron was operated in two different sputtering modes; a high-pressure high-current mode and low-pressure low-current mode. The Y-Ba-Cu-O films deposited on silicon showed an anomalous temperature behaviour after heat treatment
Keywords
annealing; barium compounds; sputter deposition; sputtered coatings; superconducting thin films; type II superconductors; yttrium compounds; DC magnetron sputtering; Si; Si(100) substrates; Y-Ba-Cu-O; YBaCuO-Si; annealing; anomalous temperature behaviour; heat treatment; high temperature superconductors; high-pressure high-current mode; low-pressure low-current mode; perovskite; substrate/interface effect;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
Filename
8206
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