DocumentCode :
129748
Title :
Effect of process parameters on structure and piezoelectric properties of AlN and AlXSc1−XN films deposited by pulsed magnetron sputtering
Author :
Barth, Stephan ; Bartzsch, Hagen ; Gloss, Daniel ; Frach, Peter ; Zywitzki, Olaf ; Herzog, Thomas ; Walter, Steffen ; Heuer, Henning
Author_Institution :
Technol. FEP, Fraunhofer Inst. for Electron Beam & Plasma, Dresden, Germany
fYear :
2014
fDate :
3-6 Sept. 2014
Firstpage :
769
Lastpage :
772
Abstract :
The paper will report on the deposition and characterization of piezoelectric AlN and AlXSc1-XN films. Potential applications of the films are in ultrasonic microscopy, energy harvesting and SAW/ BAW filters. Special focus will be on the characterization of the influences of sputter parameters on the structure and the piezoelectric properties of AlXSc1-XN.
Keywords :
aluminium compounds; piezoelectric thin films; scandium compounds; sputter deposition; AlxSc1-xN; SAW- BAW filters; energy harvesting; piezoelectric films; process parameters; pulsed magnetron sputtering; ultrasonic microscopy; Acoustics; Films; III-V semiconductor materials; Magnetomechanical effects; Sputtering; Stress; Substrates; AlN; AlScN; Sputter Deposition; Stress Control; piezoelectric;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultrasonics Symposium (IUS), 2014 IEEE International
Conference_Location :
Chicago, IL
Type :
conf
DOI :
10.1109/ULTSYM.2014.0190
Filename :
6932206
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=129748
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