• DocumentCode
    129748
  • Title

    Effect of process parameters on structure and piezoelectric properties of AlN and AlXSc1−XN films deposited by pulsed magnetron sputtering

  • Author

    Barth, Stephan ; Bartzsch, Hagen ; Gloss, Daniel ; Frach, Peter ; Zywitzki, Olaf ; Herzog, Thomas ; Walter, Steffen ; Heuer, Henning

  • Author_Institution
    Technol. FEP, Fraunhofer Inst. for Electron Beam & Plasma, Dresden, Germany
  • fYear
    2014
  • fDate
    3-6 Sept. 2014
  • Firstpage
    769
  • Lastpage
    772
  • Abstract
    The paper will report on the deposition and characterization of piezoelectric AlN and AlXSc1-XN films. Potential applications of the films are in ultrasonic microscopy, energy harvesting and SAW/ BAW filters. Special focus will be on the characterization of the influences of sputter parameters on the structure and the piezoelectric properties of AlXSc1-XN.
  • Keywords
    aluminium compounds; piezoelectric thin films; scandium compounds; sputter deposition; AlxSc1-xN; SAW- BAW filters; energy harvesting; piezoelectric films; process parameters; pulsed magnetron sputtering; ultrasonic microscopy; Acoustics; Films; III-V semiconductor materials; Magnetomechanical effects; Sputtering; Stress; Substrates; AlN; AlScN; Sputter Deposition; Stress Control; piezoelectric;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium (IUS), 2014 IEEE International
  • Conference_Location
    Chicago, IL
  • Type

    conf

  • DOI
    10.1109/ULTSYM.2014.0190
  • Filename
    6932206
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=129748