Title :
Total Dose Effect on the Propagation of Single Event Transients in a CMOS Inverter String
Author :
Buchner, Stephen ; Sibley, Michael ; Eaton, Paul ; Mavis, David ; McMorrow, Dale
Author_Institution :
NASA´´s Radiat. Hardened Electron. Group, Goddard Space Flight Center, Greenbelt, MD, USA
Abstract :
Pulsed laser light has been used to reveal how total ionizing dose radiation affects the propagation of single event transients in a string of inverters. By holding the input to the string of inverters at high voltage (1.8 V) during exposure to ionizing radiation, an asymmetry in the threshold voltages of the n-channel transistors is induced, i.e., the inputs to the inverters alternate between high and low voltage, which results in every odd-numbered n-channel transistor experiencing more Total Ionizing Dose (TID) degradation than the even-numbered n-channel transistors. The asymmetry manifests itself as an additional broadening of laser-light induced transients when the input to the string of inverters is set to low voltage and a contraction of the transients when the input is set to high voltage. Exposure of the inverter string to heavy ions with a fixed input voltage resulted in a contraction of the transients, regardless of whether the input was at high or low voltage, behavior that is consistent with the results from pulsed laser testing.
Keywords :
CMOS integrated circuits; radiation hardening (electronics); transient analysis; CMOS inverter string; `pulsed laser testing; n-channel transistors; pulsed laser light; single event transients propagation; total dose effect; total ionizing dose; total ionizing dose radiation; Circuits; Degradation; Inverters; Ionizing radiation; Ions; Lasers; Latches; Low voltage; Measurement by laser beam; Optical propagation; Optical pulses; Pulse inverters; Pulse measurements; Pulse width modulation inverters; Switches; Threshold voltage; Transistors; CMOS; inverter; laser; single event transient; total ionizing dose;
Journal_Title :
Nuclear Science, IEEE Transactions on
DOI :
10.1109/TNS.2010.2046752