• DocumentCode
    1298921
  • Title

    SRAM Interleaving Distance Selection With a Soft Error Failure Model

  • Author

    Baeg, Sanghyeon ; Wen, ShiJie ; Wong, Richard

  • Author_Institution
    Sch. of Electr. Eng. & Comput. Sci., Hanyang Univ., Ansan, South Korea
  • Volume
    56
  • Issue
    4
  • fYear
    2009
  • Firstpage
    2111
  • Lastpage
    2118
  • Abstract
    The significance of multiple cell upsets (MCUs) is revealed by sharing the soft-error test results in three major technologies, 90 nm, 65 nm, and 45 nm. The effectiveness of single-bit error correction (SEC) codes can be maximized in mitigating MCU errors when used together with the interleaving structure in memory designs. The model proposed in this paper provides failure probability to probabilistically demonstrate the benefits of various interleaving scheme selections for the memories with SEC. Grouped events such as MCU are taken into account in the proposed model by using the compound Poisson process. As a result of the proposed model, designers can perform predictive analysis of their design choices of interleaving schemes. The model successfully showed the difference in failure probability for different choices of interleaving schemes. The model behaved as the upper bound for failure probability when compared to the neutron test data with the 45-nm static-random-access memory (SRAM) design.
  • Keywords
    SRAM chips; error correction codes; failure analysis; integrated circuit design; SRAM design; compound Poisson process; failure probability; multiple cell upsets; neutron test data; single-bit error correction codes; size 45 nm; soft error failure model; static-random-access memory design; Atmospheric modeling; Error analysis; Error correction; Error correction codes; Information technology; Interleaved codes; Performance analysis; Predictive models; Random access memory; Testing; Compound-poisson; MCU; interleaving distance; scrubbing; soft error;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2009.2015312
  • Filename
    5204525