DocumentCode :
1299664
Title :
Temperature Dependence of Hysteresis Effect in Partially Depleted Silicon-on-Insulator MOSFETs
Author :
Luo, Jiexin ; Chen, Jing ; Jianhua Zhuo ; Wu, Qingqing ; Chai, Zhan ; Wang, Xi
Author_Institution :
State Key Lab. of Functional Mater. for Inf., Shanghai Inst. of Microsyst. & Inf. Technol., Shanghai, China
Volume :
12
Issue :
1
fYear :
2012
fDate :
3/1/2012 12:00:00 AM
Firstpage :
63
Lastpage :
67
Abstract :
The hysteresis effect on the output characteristics, which originates from the floating-body effect, has been measured in partially depleted (PD) silicon-on-insulator (SOI) MOSFETs, at different temperatures between 25 °C and 125 °C. For a better understanding of the hysteresis characteristics, the authors developed ID hysteresis which is defined as the difference between ID versus VD forward sweep and reverse sweep. The fabricated devices show positive and negative peaks in Id hysteresis. The experimental results show that ID hysteresis declined as the operating temperature increases. Based on the measurement, we have demonstrated the temperature dependence of hysteresis effect in PD SOI MOSFETs.
Keywords :
MOSFET; hysteresis; silicon-on-insulator; PD SOI MOSFET; Si; floating-body effect; forward sweep; hysteresis effect; partially-depleted silicon-on-insulator MOSFET; reverse sweep; temperature dependence; Hysteresis; Logic gates; MOSFET circuits; MOSFETs; Temperature; Temperature dependence; Temperature measurement; Hysteresis; MOSFET; SOI technology; partially depleted (PD) silicon-on-insulator (SOI); temperature;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2011.2165282
Filename :
5986697
Link To Document :
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