DocumentCode
1299671
Title
Stable Bipolar Resistive Switching Characteristics and Resistive Switching Mechanisms Observed in Aluminum Nitride-based ReRAM Devices
Author
Hee-Dong Kim ; Ho-Myoung An ; Eui Bok Lee ; Tae Geun Kim
Author_Institution
Sch. of Electr. Eng., Korea Univ., Seoul, South Korea
Volume
58
Issue
10
fYear
2011
Firstpage
3566
Lastpage
3573
Abstract
The authors report upon the ultrafast bipolar switching characteristics observed in aluminum nitride (AlN)-based resistive random access memory devices ReRAMs. The set and reset states were measured to be as low as 2 μA and 5 nA, respectively, at Vread = 0.1 V. Regarding pulse operations, very fast switching characteristics were achieved at 3 V/10 ns for the set operation and -3 V/10 ns for the reset operation. In addition, the AlN-based ReRAMs showed an endurance value of over ~ 108 cycles and a retention time of over ten years at 85°C. These results show that this AlN-based ReRAM can be used as a promising high-speed nonvolatile memory device.
Keywords
III-V semiconductors; aluminium compounds; random-access storage; wide band gap semiconductors; AlN; aluminum nitride-based ReRAM devices; aluminum nitride-based resistive random access memory devices; bipolar resistive switching characteristic; high-speed nonvolatile memory device; resistive switching mechanism; temperature 85 degC; ultrafast bipolar switching characteristics; voltage 0.1 V; Atomic measurements; Current density; Electron traps; Pulse measurements; Reliability; Switches; Temperature measurement; Atomic force microscopy (AFM); aluminum nitride (AlN); resistive switching (RS); space-charge-limited conduction (SCLC);
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2011.2162518
Filename
5986698
Link To Document