• DocumentCode
    1299671
  • Title

    Stable Bipolar Resistive Switching Characteristics and Resistive Switching Mechanisms Observed in Aluminum Nitride-based ReRAM Devices

  • Author

    Hee-Dong Kim ; Ho-Myoung An ; Eui Bok Lee ; Tae Geun Kim

  • Author_Institution
    Sch. of Electr. Eng., Korea Univ., Seoul, South Korea
  • Volume
    58
  • Issue
    10
  • fYear
    2011
  • Firstpage
    3566
  • Lastpage
    3573
  • Abstract
    The authors report upon the ultrafast bipolar switching characteristics observed in aluminum nitride (AlN)-based resistive random access memory devices ReRAMs. The set and reset states were measured to be as low as 2 μA and 5 nA, respectively, at Vread = 0.1 V. Regarding pulse operations, very fast switching characteristics were achieved at 3 V/10 ns for the set operation and -3 V/10 ns for the reset operation. In addition, the AlN-based ReRAMs showed an endurance value of over ~ 108 cycles and a retention time of over ten years at 85°C. These results show that this AlN-based ReRAM can be used as a promising high-speed nonvolatile memory device.
  • Keywords
    III-V semiconductors; aluminium compounds; random-access storage; wide band gap semiconductors; AlN; aluminum nitride-based ReRAM devices; aluminum nitride-based resistive random access memory devices; bipolar resistive switching characteristic; high-speed nonvolatile memory device; resistive switching mechanism; temperature 85 degC; ultrafast bipolar switching characteristics; voltage 0.1 V; Atomic measurements; Current density; Electron traps; Pulse measurements; Reliability; Switches; Temperature measurement; Atomic force microscopy (AFM); aluminum nitride (AlN); resistive switching (RS); space-charge-limited conduction (SCLC);
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2011.2162518
  • Filename
    5986698