• DocumentCode
    1299728
  • Title

    Multilevel RTS in Proton Irradiated CMOS Image Sensors Manufactured in a Deep Submicron Technology

  • Author

    Goiffon, V. ; Hopkinson, G.R. ; Magnan, P. ; Bernard, F. ; Rolland, G. ; Saint-Pé, O.

  • Author_Institution
    ISAE, Univ. de Toulouse, Toulouse, France
  • Volume
    56
  • Issue
    4
  • fYear
    2009
  • Firstpage
    2132
  • Lastpage
    2141
  • Abstract
    A new automated method able to detect multilevel random telegraph signals (RTS) in pixel arrays and to extract their main characteristics is presented. The proposed method is applied to several proton irradiated pixel arrays manufactured using a 0.18 mum CMOS process dedicated to imaging. Despite the large proton energy range and the large fluence range used, similar exponential RTS amplitude distributions are observed. A mean maximum amplitude independent of displacement damage dose is extracted from these distributions and the number of RTS defects appears to scale well with total nonionizing energy loss. These conclusions allow the prediction of RTS amplitude distributions. The effect of electric field on RTS amplitude is also studied and no significant relation between applied bias and RTS amplitude is observed.
  • Keywords
    CMOS image sensors; electric field effects; proton effects; RTS amplitude; deep submicron technology; electric field effect; multilevel random telegraph signals; nonionizing energy loss; proton energy; proton irradiated CMOS image sensors; CMOS image sensors; CMOS technology; Dark current; Image sensors; Manufacturing; Pixel; Protons; Sensor arrays; Telegraphy; Temperature; Active pixel sensors (APS); CMOS image sensors (CIS); dark current; proton irradiation; random telegraph signal (RTS);
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2009.2014759
  • Filename
    5204683