DocumentCode
1299728
Title
Multilevel RTS in Proton Irradiated CMOS Image Sensors Manufactured in a Deep Submicron Technology
Author
Goiffon, V. ; Hopkinson, G.R. ; Magnan, P. ; Bernard, F. ; Rolland, G. ; Saint-Pé, O.
Author_Institution
ISAE, Univ. de Toulouse, Toulouse, France
Volume
56
Issue
4
fYear
2009
Firstpage
2132
Lastpage
2141
Abstract
A new automated method able to detect multilevel random telegraph signals (RTS) in pixel arrays and to extract their main characteristics is presented. The proposed method is applied to several proton irradiated pixel arrays manufactured using a 0.18 mum CMOS process dedicated to imaging. Despite the large proton energy range and the large fluence range used, similar exponential RTS amplitude distributions are observed. A mean maximum amplitude independent of displacement damage dose is extracted from these distributions and the number of RTS defects appears to scale well with total nonionizing energy loss. These conclusions allow the prediction of RTS amplitude distributions. The effect of electric field on RTS amplitude is also studied and no significant relation between applied bias and RTS amplitude is observed.
Keywords
CMOS image sensors; electric field effects; proton effects; RTS amplitude; deep submicron technology; electric field effect; multilevel random telegraph signals; nonionizing energy loss; proton energy; proton irradiated CMOS image sensors; CMOS image sensors; CMOS technology; Dark current; Image sensors; Manufacturing; Pixel; Protons; Sensor arrays; Telegraphy; Temperature; Active pixel sensors (APS); CMOS image sensors (CIS); dark current; proton irradiation; random telegraph signal (RTS);
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2009.2014759
Filename
5204683
Link To Document